THERMAL TREATMENT DEVICE

To provide a thermal treatment device capable of efficiently heating a substrate.SOLUTION: A flush heating part 5 comprising a plurality of flush lamps FL is provided on an upper side of a chamber 6 for housing a semiconductor wafer W is provided, and an auxiliary heating part 4 having a plurality o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIGEMASU SHOGO, YAMADA TAKAYASU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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