HIGH-FREQUENCY POWER SUPPLY, PLASMA PROCESSING DEVICE, AND MATCHING METHOD

To provide a technique for quickly determining the matching frequency of high-frequency power used in plasma generation.SOLUTION: A high-frequency power supply obtains three reflection coefficients by using mutually different first to third frequencies as frequencies of high-frequency power. The hig...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OSADA ISATERU, MIYASHITA HIROYUKI, IKEDA TARO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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