HIGH-FREQUENCY POWER SUPPLY, PLASMA PROCESSING DEVICE, AND MATCHING METHOD

To provide a technique for quickly determining the matching frequency of high-frequency power used in plasma generation.SOLUTION: A high-frequency power supply obtains three reflection coefficients by using mutually different first to third frequencies as frequencies of high-frequency power. The hig...

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Hauptverfasser:	OSADA ISATERU, MIYASHITA HIROYUKI, IKEDA TARO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Zusammenfassung:	To provide a technique for quickly determining the matching frequency of high-frequency power used in plasma generation.SOLUTION: A high-frequency power supply obtains three reflection coefficients by using mutually different first to third frequencies as frequencies of high-frequency power. The high-frequency power supply determines a frequency of a minimum point of a quadratic function representing a relation between the first to third frequencies and the three reflection coefficients as a matching frequency. The high-frequency power supply generates high-frequency power having the determined matching frequency.SELECTED DRAWING: Figure 3 【課題】プラズマの生成において用いられる高周波電力の整合周波数を高速に決定する技術を提供する。【解決手段】開示される高周波電源は、高周波電力の周波数として互いに異なる第１～第３の周波数を用いることにより、三つの反射係数を取得する。高周波電源は、第１～第３の周波数と三つの反射係数との関係を表す二次関数の極小点の周波数を、整合周波数として決定する。高周波電源は、決定された整合周波数を有する高周波電力を発生する。【選択図】図３