SCANNING EXPOSURE DEVICE, SCANNING EXPOSURE METHOD, PRODUCTION METHOD OF ARTICLE, INFORMATION PROCESSOR, INFORMATION PROCESSING METHOD, AND PROGRAM

To provide a technique advantageous in accurately conducting a focus-leveling control at scanning exposure.SOLUTION: A scanning exposure device includes: a measurement part configured to measure a surface height distribution of a substrate; and a control part configured to control, while controlling a scanning drive of the substrate according to drive control information generated in advance, at least one of a height and a tilt of the substrate according to the surface height distribution of the substrate measured by the measurement part, at scanning exposure of the substrate. The drive control information includes adjustment information for adjusting at least one of the height and the tilt of the substrate at the scanning exposure. The control part updates the drive control information according to the surface height distribution of the substrate measured by the measurement part at the scanning exposure of the substrate.SELECTED DRAWING: Figure 1 【課題】走査露光においてフォーカス・レベリング制御を精度よく行うために有利な技術を提供する。【解決手段】走査露光装置は、基板の表面高さ分布を計測する計測部と、前記基板の走査露光において、事前に生成された駆動制御情報に基づいて前記基板の走査駆動を制御しながら、前記計測部により計測された前記基板の表面高さ分布に応じて前記基板の高さおよび傾きのうち少なくとも１つを制御する制御部と、を備え、前記駆動制御情報は、走査露光における前記基板の高さおよび傾きのうち少なくとも１つを調整するための調整情報を含み、前記制御部は、前記基板の走査露光において前記計測部により計測された前記基板の表面高さ分布に基づいて前記駆動制御情報を更新する。【選択図】図１