EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD

To provide a lithography device advantageous in a production cost and a through-put with regard to correction processing for a placement error of a plurality of substrates.SOLUTION: An exposure device includes: a holding part configured to hold a plurality of substrates arranged on one holding face;...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HORIGOME SHOTA, IWASAKI YASUHISA, USUI KATSUTOSHI, MIYAMOTO KAZUTERU, TOBA YUKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!