SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME

To provide a substrate processing composition and a substrate processing method which can suppress contamination due to metal during an edge rinsing step or a subsequent substrate cleaning step in a lithography process using a metal-containing resist composition and the resulting deterioration of el...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YANG JINSEOK, HAH JUNGHWAN, JO SUYEON
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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