METHOD FOR PRODUCING ORGANICALLY-MODIFIED INORGANIC FINE PARTICLE, AND ORGANICALLY-MODIFIED INORGANIC FINE PARTICLE

To simply provide organically-modified inorganic fine particles which can uniformly organically modify the whole surface of raw material particles such as AlN, TiN, Si3N4 and SiC having various molecule structures by a common method, and thereby further enhance dispersibility to a solvent.SOLUTION: There is provided a method for producing organically-modified inorganic fine particles. The method includes: an oxide layer formation step of forming an oxide layer, an oxyhydroxide layer and/or a hydroxide layer on the surface of at least one or more raw material particles selected from an inorganic nitride, an inorganic carbide, an inorganic sulfide and an insoluble salt; and an organic modification step of organically modifying raw material particles formed with the oxide layer, the oxyhydroxide layer and/or the hydroxide layer in a reaction field of a supercritical, a subcritical or gas-phase aqueous solvent, and obtaining organically-modified inorganic fine particles.SELECTED DRAWING: Figure 5 【課題】ＡｌＮ、ＴｉＮ、Ｓｉ３Ｎ４、ＳｉＣ等、様々な分子構造をもつ原料粒子について、原料粒子の表面全体にわたって共通の手法で均一に有機修飾できるようにすることで、溶媒への分散性をよりいっそう高めた有機修飾無機微粒子を簡便に提供可能にする。【解決手段】本発明は、有機修飾無機微粒子の製造方法である。この方法は、無機窒化物、無機炭化物、無機硫化物、及び不溶性塩から選択される少なくとも１種以上の原料粒子の表面に酸化物層、オキシ水酸化物層及び／又は水酸化物層を形成する酸化物層等形成工程と、酸化物層、オキシ水酸化物層及び／又は水酸化物層が形成された原料粒子を、超臨界、亜臨界、又は気相の水系溶媒の反応場で有機修飾して有機修飾無機微粒子を得る有機修飾工程と、を含む。【選択図】図５