CLEANING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

To provide a cleaning device capable of suitably cleaning a container for substrate housing, and a method for manufacturing a semiconductor device.SOLUTION: According to an embodiment, a cleaning device comprises a temperature adjustment unit which supplies a first fluid for cleaning a container for substrate housing and having a first temperature and a second fluid for cleaning the container and having a second temperature lower than the first temperature by heating the first fluid and/or cooling the second fluid. The cleaning device further comprises a cleaning unit which heats and cleans the container by supplying the first fluid supplied from the temperature adjustment unit to a first surface of the container, and cools and cleans the container by supplying the second fluid supplied from the temperature adjustment unit to a second surface of the container.SELECTED DRAWING: Figure 1 【課題】基板収納用の容器を好適に洗浄可能な洗浄装置、および半導体装置の製造方法に関する。【解決手段】一の実施形態によれば、洗浄装置は、基板収納用の容器を洗浄する第１流体を加熱し、および／または、前記容器を洗浄する第２流体を冷却することで、第１温度を有する前記第１流体と、前記第１温度よりも低い第２温度を有する前記第２流体とを供給する温度調整部を備える。前記装置はさらに、前記温度調整部から供給された前記第１流体を前記容器の第１面に供給することで、前記容器を加熱および洗浄し、前記温度調整部から供給された前記第２流体を前記容器の第２面に供給することで、前記容器を冷却および洗浄する洗浄部を備える。【選択図】図１