PHOTOSENSITIVE COMPOSITION, CURED FILM USING THE SAME, OPTICAL FILTER, IMAGE DISPLAY DEVICE, SOLID-STATE IMAGING ELEMENT AND INFRARED SENSOR

To provide a photosensitive composition capable of forming a cured film having excellent solvent resistance, high-temperature and high-humidity resistance, less development residue and less line thickening.SOLUTION: There is provided a photosensitive composition which comprises a near-infrared absorbing dye (A), a polymerizable monomer (B) and a photopolymerization initiator (C), wherein the mass ratio, the photopolymerization initiator (C)/the polymerizable monomer (B) of the photopolymerization initiator (C) to the polymerizable monomer (B) is 0.15 or less. In addition, the polymerizable monomer (B) includes a polymerizable monomer (B-1) having at least one selected from an acid group and a hydroxy group and the content of the polymerizable monomer (B-1) in 100 mass% of the polymerizable monomer (B) is preferably 50 mass% or more.SELECTED DRAWING: Figure 1 【課題】本発明は、溶剤耐性・高温高湿耐性に優れ、現像残渣が少なく、線幅太りが少ない硬化膜を形成できる感光性組成物の提供を目的する。【解決手段】近赤外線吸収色素（Ａ）、重合性単量体（Ｂ）、および光重合開始剤（Ｃ）を含む感光性組成物であって、光重合開始剤（Ｃ）と重合性単量体（Ｂ）の質量比、光重合開始剤（Ｃ）／ 重合性単量体（Ｂ）が０．１５以下であることを特徴とする感光性組成物。なお、前記重合性単量体（Ｂ）は、酸基および水酸基から選ばれる少なくとも１種を有する重合性単量体（Ｂ－１）を含み、重合性単量体（Ｂ）１００質量％中、前記重合性単量体（Ｂ－１）の含有量が５０質量％以上が好ましい。【選択図】図１