APPARATUS FOR FORMING DIAMOND BY HIGH FREQUENCY PLASMA CVD

To provide an apparatus for forming a diamond by high frequency plasma CVD, capable of solving the problems that a microwave plasma CVD apparatus and a hot filament CVD apparatus, etc., are developed for forming a diamond film as a power semiconductor material, but it is difficult for the former to...

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Bibliographische Detailangaben
1. Verfasser: MURATA MASAYOSHI
Format: Patent
Sprache:eng ; jpn
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