COMPOSITION FOR FORMATION OF DESORBABLE FILM
To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by tr...
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| creator | NAGAKAWA KENTARO KUDO TAKAAKI ITO SATOKO WAKAHARA KEISUKE KAWASHIMA YASUNARI SAKURAI MUNENORI EBATO HIROSHI |
| description | To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by treatment with alkali solution on the surface of a base material A directly or through another layer. The composition includes an urethane resin having a hydroxyl value, and a weight average molecular weight of 45,000 or more and a number average molecular weight of 10,000 or more. Preferably, the hydroxyl value in the composition for film formation is 1.0 mgKOH/g to 30.0 mgKOH/g.SELECTED DRAWING: None
【課題】汎用プラスチック基材に対して、簡便な方法で皮膜層を容易に脱離することができる皮膜形成用組成物を提供する。【解決手段】アルカリ溶液での処理により脱離する皮膜を基材Ａの表面に直接又は他の層を介して形成するための脱離可能な皮膜形成用組成物であって、水酸基価を有し、重量平均分子量が４５，０００以上かつ数平均分子量が１０，０００以上であるウレタン樹脂を含有する、皮膜形成用組成物。好ましくは、前記皮膜形成用組成物における前記水酸基価が、１．０ｍｇＫＯＨ／ｇ～３０．０ｍｇＫＯＨ／ｇである。【選択図】なし |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2023155250A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2023155250A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2023155250A3</originalsourceid><addsrcrecordid>eNrjZNBx9vcN8A_2DPH091Nw8w8CYV9HMM_fTcHFNdg_yMnRycdVwc3Tx5eHgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBkbmpoamRo4GhOlCADmRSWT</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>COMPOSITION FOR FORMATION OF DESORBABLE FILM</title><source>esp@cenet</source><creator>NAGAKAWA KENTARO ; KUDO TAKAAKI ; ITO SATOKO ; WAKAHARA KEISUKE ; KAWASHIMA YASUNARI ; SAKURAI MUNENORI ; EBATO HIROSHI</creator><creatorcontrib>NAGAKAWA KENTARO ; KUDO TAKAAKI ; ITO SATOKO ; WAKAHARA KEISUKE ; KAWASHIMA YASUNARI ; SAKURAI MUNENORI ; EBATO HIROSHI</creatorcontrib><description>To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by treatment with alkali solution on the surface of a base material A directly or through another layer. The composition includes an urethane resin having a hydroxyl value, and a weight average molecular weight of 45,000 or more and a number average molecular weight of 10,000 or more. Preferably, the hydroxyl value in the composition for film formation is 1.0 mgKOH/g to 30.0 mgKOH/g.SELECTED DRAWING: None
【課題】汎用プラスチック基材に対して、簡便な方法で皮膜層を容易に脱離することができる皮膜形成用組成物を提供する。【解決手段】アルカリ溶液での処理により脱離する皮膜を基材Ａの表面に直接又は他の層を介して形成するための脱離可能な皮膜形成用組成物であって、水酸基価を有し、重量平均分子量が４５，０００以上かつ数平均分子量が１０，０００以上であるウレタン樹脂を含有する、皮膜形成用組成物。好ましくは、前記皮膜形成用組成物における前記水酸基価が、１．０ｍｇＫＯＨ／ｇ～３０．０ｍｇＫＯＨ／ｇである。【選択図】なし</description><language>eng ; jpn</language><subject>ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COLOUR PRINTING ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; INKS ; LINING MACHINES ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PERFORMING OPERATIONS ; POLISHES ; PRINTING ; PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES ; STAMPS ; TRANSPORTING ; TYPEWRITERS ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231020&DB=EPODOC&CC=JP&NR=2023155250A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231020&DB=EPODOC&CC=JP&NR=2023155250A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAGAKAWA KENTARO</creatorcontrib><creatorcontrib>KUDO TAKAAKI</creatorcontrib><creatorcontrib>ITO SATOKO</creatorcontrib><creatorcontrib>WAKAHARA KEISUKE</creatorcontrib><creatorcontrib>KAWASHIMA YASUNARI</creatorcontrib><creatorcontrib>SAKURAI MUNENORI</creatorcontrib><creatorcontrib>EBATO HIROSHI</creatorcontrib><title>COMPOSITION FOR FORMATION OF DESORBABLE FILM</title><description>To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by treatment with alkali solution on the surface of a base material A directly or through another layer. The composition includes an urethane resin having a hydroxyl value, and a weight average molecular weight of 45,000 or more and a number average molecular weight of 10,000 or more. Preferably, the hydroxyl value in the composition for film formation is 1.0 mgKOH/g to 30.0 mgKOH/g.SELECTED DRAWING: None
【課題】汎用プラスチック基材に対して、簡便な方法で皮膜層を容易に脱離することができる皮膜形成用組成物を提供する。【解決手段】アルカリ溶液での処理により脱離する皮膜を基材Ａの表面に直接又は他の層を介して形成するための脱離可能な皮膜形成用組成物であって、水酸基価を有し、重量平均分子量が４５，０００以上かつ数平均分子量が１０，０００以上であるウレタン樹脂を含有する、皮膜形成用組成物。好ましくは、前記皮膜形成用組成物における前記水酸基価が、１．０ｍｇＫＯＨ／ｇ～３０．０ｍｇＫＯＨ／ｇである。【選択図】なし</description><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COLOUR PRINTING</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>INKS</subject><subject>LINING MACHINES</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>PRINTING</subject><subject>PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBx9vcN8A_2DPH091Nw8w8CYV9HMM_fTcHFNdg_yMnRycdVwc3Tx5eHgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBkbmpoamRo4GhOlCADmRSWT</recordid><startdate>20231020</startdate><enddate>20231020</enddate><creator>NAGAKAWA KENTARO</creator><creator>KUDO TAKAAKI</creator><creator>ITO SATOKO</creator><creator>WAKAHARA KEISUKE</creator><creator>KAWASHIMA YASUNARI</creator><creator>SAKURAI MUNENORI</creator><creator>EBATO HIROSHI</creator><scope>EVB</scope></search><sort><creationdate>20231020</creationdate><title>COMPOSITION FOR FORMATION OF DESORBABLE FILM</title><author>NAGAKAWA KENTARO ; KUDO TAKAAKI ; ITO SATOKO ; WAKAHARA KEISUKE ; KAWASHIMA YASUNARI ; SAKURAI MUNENORI ; EBATO HIROSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023155250A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COLOUR PRINTING</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>INKS</topic><topic>LINING MACHINES</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>PRINTING</topic><topic>PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>NAGAKAWA KENTARO</creatorcontrib><creatorcontrib>KUDO TAKAAKI</creatorcontrib><creatorcontrib>ITO SATOKO</creatorcontrib><creatorcontrib>WAKAHARA KEISUKE</creatorcontrib><creatorcontrib>KAWASHIMA YASUNARI</creatorcontrib><creatorcontrib>SAKURAI MUNENORI</creatorcontrib><creatorcontrib>EBATO HIROSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAGAKAWA KENTARO</au><au>KUDO TAKAAKI</au><au>ITO SATOKO</au><au>WAKAHARA KEISUKE</au><au>KAWASHIMA YASUNARI</au><au>SAKURAI MUNENORI</au><au>EBATO HIROSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COMPOSITION FOR FORMATION OF DESORBABLE FILM</title><date>2023-10-20</date><risdate>2023</risdate><abstract>To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by treatment with alkali solution on the surface of a base material A directly or through another layer. The composition includes an urethane resin having a hydroxyl value, and a weight average molecular weight of 45,000 or more and a number average molecular weight of 10,000 or more. Preferably, the hydroxyl value in the composition for film formation is 1.0 mgKOH/g to 30.0 mgKOH/g.SELECTED DRAWING: None
【課題】汎用プラスチック基材に対して、簡便な方法で皮膜層を容易に脱離することができる皮膜形成用組成物を提供する。【解決手段】アルカリ溶液での処理により脱離する皮膜を基材Ａの表面に直接又は他の層を介して形成するための脱離可能な皮膜形成用組成物であって、水酸基価を有し、重量平均分子量が４５，０００以上かつ数平均分子量が１０，０００以上であるウレタン樹脂を含有する、皮膜形成用組成物。好ましくは、前記皮膜形成用組成物における前記水酸基価が、１．０ｍｇＫＯＨ／ｇ～３０．０ｍｇＫＯＨ／ｇである。【選択図】なし</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COLOUR PRINTING CORRECTING FLUIDS DYES FILLING PASTES INKS LINING MACHINES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES STAMPS TRANSPORTING TYPEWRITERS USE OF MATERIALS THEREFOR WOODSTAINS |
| title | COMPOSITION FOR FORMATION OF DESORBABLE FILM |
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