COMPOSITION FOR FORMATION OF DESORBABLE FILM
To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by tr...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a composition for film formation which makes it possible to easily desorb a film layer with a simple method from a general-purpose plastic substrate.SOLUTION: The present invention provides a composition for the formation of a desorbable film. The composition forms a film desorbable by treatment with alkali solution on the surface of a base material A directly or through another layer. The composition includes an urethane resin having a hydroxyl value, and a weight average molecular weight of 45,000 or more and a number average molecular weight of 10,000 or more. Preferably, the hydroxyl value in the composition for film formation is 1.0 mgKOH/g to 30.0 mgKOH/g.SELECTED DRAWING: None
【課題】汎用プラスチック基材に対して、簡便な方法で皮膜層を容易に脱離することができる皮膜形成用組成物を提供する。【解決手段】アルカリ溶液での処理により脱離する皮膜を基材Aの表面に直接又は他の層を介して形成するための脱離可能な皮膜形成用組成物であって、水酸基価を有し、重量平均分子量が45,000以上かつ数平均分子量が10,000以上であるウレタン樹脂を含有する、皮膜形成用組成物。好ましくは、前記皮膜形成用組成物における前記水酸基価が、1.0mgKOH/g~30.0mgKOH/gである。【選択図】なし |
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