COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERN FORMATION METHOD

To provide a silicon-containing metal hard mask forming composition that has a high super fine pattern collapse prevention effect in a multilayer resist method, can form a resist pattern excellent in LWR, and has excellent dry-etching resistance and wet detachability to a conventional silicon-contai...

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Bibliographische Detailangaben
Hauptverfasser:	TAKIZAWA KANATA, KOBAYASHI NAOKI, YANO TOSHIHARU, MITSUI RYO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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