CHARGED PARTICLE BEAM DEVICE
To provide a charged particle beam device which can correct an irradiation position of a probe at a proper frequency.SOLUTION: A charged particle beam device according to the present invention for forming a probe with a charged particle beam and acquiring a scan image by scanning a sample with the p...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a charged particle beam device which can correct an irradiation position of a probe at a proper frequency.SOLUTION: A charged particle beam device according to the present invention for forming a probe with a charged particle beam and acquiring a scan image by scanning a sample with the probe comprises: an optical system for scanning the sample with the probe; a detector which detects a signal generated in the sample by scanning the sample with the probe; and a control unit which controls the optical system. The control unit executes correction processing of acquiring a reference image obtained by scanning the sample with the probe, obtaining a drift amount by comparing the reference image with a standard image and correcting a deviation of the irradiation position of the probe on the sample on the basis of the drift amount, and processing of setting a frequency of executing the correction processing on the basis of the drift amount.SELECTED DRAWING: Figure 3
【課題】プローブの照射位置の補正を適切な頻度で行うことが可能な荷電粒子線装置を提供する。【解決手段】本発明に係る荷電粒子線装置は、荷電粒子線でプローブを形成し、プローブで試料を走査して走査像を取得する荷電粒子線装置であって、プローブで試料を走査するための光学系と、プローブで試料を走査することによって試料で発生した信号を検出する検出器と、光学系を制御する制御部と、を含み、制御部は、プローブで試料を走査して得られた参照画像を取得し、参照画像と基準画像を比較してドリフト量を求め、ドリフト量に基づいて試料上におけるプローブの照射位置のずれを補正する補正処理と、ドリフト量に基づいて補正処理を実行する頻度を設定する処理と、を行う。【選択図】図3 |
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