SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

To provide a substrate processing apparatus and a substrate processing method that improve the efficiency of freezing and cleaning substrates.SOLUTION: A substrate processing apparatus according to an embodiment includes a substrate holding unit including a stage that holds a substrate substantially horizontally, a freezing liquid supply unit that supplies freezing liquid to the substrate, a cooling unit that cools the frozen liquid to form a frozen film, and a thawing liquid supply unit that includes a nozzle that extends in a first direction including the center of the stage, and in which one end in the first direction and the other end opposite to the one end are located on the outer periphery outside the center in a plan view, and thaws the frozen film by supplying a thawing liquid to the substrate in which at least one of the supply amount, temperature, and supply timing is different between the center and the outer periphery of the stage.SELECTED DRAWING: Figure 1 【課題】基板の凍結洗浄効率を向上した、基板処理装置および基板処理方法を提供する。【解決手段】一実施形態にかかる基板処理装置は、基板を略水平に保持するステージを備える基板保持部と、基板に凍結液を供給する凍結液供給部と、凍結液を冷却して凍結膜を形成する冷却部と、平面視において、ステージの中心部を含む第１方向に延在し、第１方向の一端および一端とは反対側の他端が、中心部よりも外側の外周部に位置するノズルを備え、供給量、温度、供給タイミングの少なくとも１つが、中心部と外周部とで異なる解凍液を基板に供給して、凍結膜を解凍する解凍液供給部と、を含む。【選択図】図１