SUBSTRATE TRANSFER SYSTEM, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
To provide a substrate transfer system in which the position of a transfer unit (hand) can be grasped within a system by deriving the distance between the hand and a substrate on the basis of a suction state of the substrate.SOLUTION: A substrate transfer system that transfers a substrate to a prede...
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| Sprache: | eng ; jpn |
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| Zusammenfassung: | To provide a substrate transfer system in which the position of a transfer unit (hand) can be grasped within a system by deriving the distance between the hand and a substrate on the basis of a suction state of the substrate.SOLUTION: A substrate transfer system that transfers a substrate to a predetermined position includes a hand that holds the substrate by suction, and moves at least one of the hand and the substrate in a direction in which the hand and the substrate approach each other until the substrate is attracted to the hand, and derives a relative movement amount between the hand and the substrate until the substrate is attracted to the hand.SELECTED DRAWING: Figure 12
【課題】 基板の吸着状態に基づいて搬送ユニット（ハンド）と基板との間の距離を導出することで、ハンドの位置をシステム内で把握することが可能な基板搬送システムを提供する。【解決手段】 基板を所定位置に搬送する基板搬送システムであって、前記基板を吸着保持するハンドを有し、前記基板が前記ハンドに吸着されるまで前記ハンドと前記基板の少なくとも一方を、前記ハンドと前記基板とが近づく方向に移動させ、前記基板が前記ハンドに吸着されるまでの前記ハンドと前記基板との相対的な移動量を導出する。【選択図】 図１２ |
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