FILM FORMING APPARATUS AND FILM FORMING METHOD

To suppress an influence of an aluminum fluoride on film formation, the aluminum fluoride being generated by a reaction between a fluorine-containing gas as a cleaning gas and an aluminum-containing stage when an interior of a processing container is cleaned with the fluorine-containing gas after film forming processing.SOLUTION: A film forming apparatus includes: a processing container; an aluminum-containing stage which is provided in the processing container and on which a substrate is placed; a heating mechanism which heats the stage; a gas supply mechanism which supplies a film formation gas and a fluorine-containing gas for cleaning into the processing container; and a cover member which is provided to cover portions of the stage other than a substrate placing surface. When, after the film formation gas is supplied into the processing container to form a film on the substrate, the fluorine-containing gas is supplied into the processing container to clean the inside of the processing container, the cover member adsorbs an aluminum fluoride that is generated by a reaction between aluminum in the stage and the fluorine-containing gas and that sublimates in the processing container.SELECTED DRAWING: Figure 1 【課題】成膜処理後のフッ素含有ガスによる処理容器内のクリーニングの際に、クリーニングガスであるフッ素含有ガスとアルミニウムを含有する載置台との反応により生成するアルミニウムフッ化物の成膜に対する影響を抑制する。【解決手段】成膜装置は、処理容器と、処理容器内に設けられ、基板を載置するアルミニウムを含有する載置台と、載置台を加熱する加熱機構と、処理容器内に成膜用のガスおよびクリーニング用のフッ素含有ガスを供給するガス供給機構と、載置台の基板載置面以外の部分を覆うように設けられたカバー部材とを有する。カバー部材は、処理容器内に成膜用のガスを供給して基板上に膜を成膜した後、処理容器内にフッ素含有ガスを供給して処理容器内のクリーニングを行う際に、載置台のアルミニウムとフッ素含有ガスとの反応により生成され、処理容器内で昇華するアルミニウムフッ化物を吸着する。【選択図】 図１