SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

To provide a technique capable of suppressing collapse of a pattern formed on a substrate.SOLUTION: A substrate processing system includes: a loading/unloading portion where cassettes housing a plurality of substrates are loaded/unloaded; a batch processing portion that processes a lot including a plurality of the substrates at once with each of the substrates standing upright; a single wafer processing portion that processes the substrates of the lot one by one in a horizontal state; and an interface portion that transfers the substrate from the batch processing portion to the single wafer processing portion. The interface portion includes a standby portion that holds the substrate horizontally in contact with pure water, and a transport mechanism that delivers the substrate from the batch processing portion to the standby portion.SELECTED DRAWING: Figure 9 【課題】基板に形成されたパターンの倒壊を抑制することができる技術を提供する。【解決手段】基板処理システムは、複数枚の基板を収容したカセットが搬入出される搬入出部と、複数枚の前記基板を含むロットを、前記基板の各々を直立させた状態で一括して処理するバッチ処理部と、前記ロットの前記基板を水平な状態で１枚ずつ処理する枚葉処理部と、前記バッチ処理部から前記枚葉処理部へと前記基板を受け渡すインタフェース部と、を有し、前記インタフェース部は、前記基板を純水に接触させた状態で水平に保持する待機部と、前記バッチ処理部から前記待機部へと前記基板を受け渡す搬送機構と、を有する。【選択図】図９