TRIMETHYLALUMINUM-CONTAINING COMPOSITION AND PRODUCTION METHOD OF THE SAME

To provide a trimethylaluminum (TMAL)-containing composition in which dimethylaluminum chloride (DMAC) and dimethylaluminum hydride (DMAH) are reduced to such a degree that the function of TMAL is not inhibited.SOLUTION: A TMAL-containing composition has a DMAH content of 0.1 ppm to 500 ppm in terms...

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Bibliographische Detailangaben
Hauptverfasser: SUMITA WATARU, YAMANE TAKEO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a trimethylaluminum (TMAL)-containing composition in which dimethylaluminum chloride (DMAC) and dimethylaluminum hydride (DMAH) are reduced to such a degree that the function of TMAL is not inhibited.SOLUTION: A TMAL-containing composition has a DMAH content of 0.1 ppm to 500 ppm in terms of hydrogen atom mass and a DMAC content of 15 ppm or less in terms of chlorine atom mass. A production method of a TMAL-containing composition comprises: step (1) of mixing TMAL containing DMAC as an impurity and a compound represented by MIMIIHR3 (a combination of MI which is a first group element; MII which is a 13th group element; and R which is a hydrogen, an alkyl group, an alkoxy group or a cyano group); and step (2) of distilling a mixture obtained by the mixing to obtain a TMAL-containing composition as a main fraction. A quantity of the compound represented by a general formula (A) is 1 equivalent to 20 equivalents relative to DMAC.SELECTED DRAWING: None 【課題】ジメチルアルミニウムクロライド(DMAC)及びジメチルアルミニウムハイドライド(DMAH)を、トリメチルアルミニウム(TMAL)の働きを阻害しない程度に低減したTMAL含有組成物を提供する。【解決手段】DMAHの含有量は水素原子質量換算で0.1ppm以上500ppm以下の範囲であり、DMACの含有量が塩素原子質量換算で15ppm以下であるTMAL含有組成物。不純物としてDMACを含むTMALと、MIMIIHR3で示される化合物(MIは第1族元素、MIIは第13族元素、Rは水素、アルキル基、アルコキシ基及びシアノ基のいずれかの組み合わせ)を混合する工程(1)、前記混合により得られた混合物を蒸留して、主留分としてTMAL含有組成物を得る工程(2)を含むTMAL含有組成物の製造方法。一般式(A)で示される化合物の混合量が、DMACに対して1当量以上、20当量以下の範囲である。【選択図】なし