ELECTROLESS PLATING INHIBITING COMPOSITION AND METHOD FOR PRODUCING PLATED COMPONENT

To provide an electroless plating inhibiting composition capable of improving the deposition and selectivity of electroless plating when forming a high-definition pattern.SOLUTION: An electroless plating inhibiting composition includes a catalytic activity inhibitor to inhibit the activity of an ele...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUSA ATSUSHI, SUZUKI TATSUKI, TSUCHIHATA MIYUKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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