METHOD FOR MANUFACTURING FILM

To provide a technology of depositing a high quality MgF2 film with high film deposition efficiency.SOLUTION: A method for depositing a film includes the steps of: supplying a Mg source to a film deposition chamber; and supplying a fluorinating agent and an oxidizing agent to the film deposition cha...

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Bibliographische Detailangaben
Hauptverfasser:	IMASE AKIKIMI, JO EIKA, MIHASHI SATOSHI, YAMAZAKI SHOYA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a technology of depositing a high quality MgF2 film with high film deposition efficiency.SOLUTION: A method for depositing a film includes the steps of: supplying a Mg source to a film deposition chamber; and supplying a fluorinating agent and an oxidizing agent to the film deposition chamber so that the fluorinating agent and the oxidizing agent coexist.SELECTED DRAWING: Figure 1 【課題】成膜効率が高い高品質なＭｇＦ２膜の成膜技術を提供する。【解決手段】成膜方法であって、成膜室にＭｇ源が供給される工程と、成膜室にフッ化剤と酸化剤とが併存するよう前記フッ化剤と前記酸化剤とが供給される工程とを具備する。【選択図】図１