METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

To provide a method for manufacturing a semiconductor element, which can suppress electrode detachment when forming electrodes using photoresist.SOLUTION: A method for manufacturing a semiconductor element of the present disclosure includes depositing a Ni electrode layer on a p-type semiconductor l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAWATARI MIKIHISA, TANNO KATSUNORI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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