SUBSTRATE LOADING TABLE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR HEATING SUSCEPTOR

To provide a substrate loading table that restrains a product material from adhering to a chamber wall, a substrate processing apparatus, and a method for heating a susceptor.SOLUTION: A substrate loading table comprises: a susceptor for being loaded with a substrate; a support that is formed with a...

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Hauptverfasser: HATANO TATSUO, WATANABE NAOKI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a substrate loading table that restrains a product material from adhering to a chamber wall, a substrate processing apparatus, and a method for heating a susceptor.SOLUTION: A substrate loading table comprises: a susceptor for being loaded with a substrate; a support that is formed with an internal space on the backside of the susceptor so as to support the susceptor; a bottom electrode that is provided in the internal space; a power source for supplying electric power to the bottom electrode; and a plasma production gas supply part that supplies gas for producing plasma into the internal space.SELECTED DRAWING: Figure 2 【課題】生成物のチャンバ壁への付着を抑制する基板載置台、基板処理装置及びサセプタの加熱方法を提供する。【解決手段】基板を載置するサセプタと、前記サセプタの裏面側に内部空間を形成して前記サセプタを支持する支持体と、前記内部空間に設けられる下部電極と、前記下部電極に電力を供給する電源と、前記内部空間にプラズマを生成するガスを供給するプラズマ生成ガス供給部と、を備える、基板載置台。【選択図】図2