IODINE-CONTAINING METAL COMPOUND AND THIN FILM VAPOR DEPOSITING COMPOSITION INCLUDING THE SAME

To provide a metal compound containing iodine, a metal-containing thin film vapor depositing composition, and a method for manufacturing a metal-containing thin film using the same.SOLUTION: A thin film vapor depositing composition is present in a liquid state at room temperature, excellent in stora...

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Hauptverfasser:	YOUNG JAE, LEE SANG ICK, KWONE YONG HEE, LEE SANG CHAN, JEON SANG YONG, BYUN TAE SEOK
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a metal compound containing iodine, a metal-containing thin film vapor depositing composition, and a method for manufacturing a metal-containing thin film using the same.SOLUTION: A thin film vapor depositing composition is present in a liquid state at room temperature, excellent in storage and handling, and has high reactivity, thereby efficiently forming a metal thin film using the same.SELECTED DRAWING: Figure 1 【課題】本開示は、ヨウ素を含む金属化合物、これを含む金属含有薄膜蒸着用組成物およびこれを用いた金属含有薄膜の製造方法に関する。【解決手段】一実施形態による薄膜蒸着用組成物は、常温で液体状態で存在して保管および取り扱いに優れ、高い反応性を有することから、これを用いて、金属薄膜を効率的に形成することができる。【選択図】図１