METROLOGY METHOD, TARGET, AND SUBSTRATE

METROLOGY METHOD, TARGET, AND SUBSTRATE

To provide a method and apparatus for metrology using a target, in which throughput, flexibility and/or accuracy can be improved.SOLUTION: A diffraction measurement target has at least a first sub-target and at least a second sub-target. The first and second sub-targets each include a pair of period...

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Hauptverfasser: VAN BUEL HENRICUS WILHELMUS MARIA, SCHAAR MAURITS VAN DER, MICHAEL KUBIS, DEN BOEF ARIE JEFFREY, JOHANNES MARCUS MARIA BELTMAN, ANDREAS FUCHS, BHATTACHARYA KAUSTUBH, HENDRIK JAN HIDDE SMILDE, CHRISTOPHE DAVID FOUQUET, OMER ABUBAKER OMER ADAM, JAK MARTIN JACOBUS JOHAN, LIU XING LAN, FRANCISCUS VAN HAREN RICHARD JOHANNES
Format: Patent
Sprache:eng ; jpn
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Zusammenfassung:To provide a method and apparatus for metrology using a target, in which throughput, flexibility and/or accuracy can be improved.SOLUTION: A diffraction measurement target has at least a first sub-target and at least a second sub-target. The first and second sub-targets each include a pair of periodic structures, and the first sub-target has a different design than the second sub-target. The different design includes the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure.SELECTED DRAWING: Figure 11 【課題】スループット、柔軟性、及び／又は精度を向上させることが可能な、ターゲットを使用するメトロロジーのための方法及び装置を提供する。【解決手段】少なくとも第１のサブターゲット及び少なくとも第２のサブターゲットを有する回折測定ターゲットであって、第１及び第２のサブターゲットは各々周期構造のペアを含み、第１のサブターゲットは第２のサブターゲットとは異なる設計を有し、異なる設計は、第２のサブターゲット周期構造とは異なるピッチ、フィーチャ幅、空間幅、及び／又はセグメンテーションを有する第１のサブターゲット周期構造を含む。【選択図】図１１