METHOD AND APPARATUS FOR MODIFYING FLUORORESIN
To provide an improved method and apparatus for modifying a fluororesin.SOLUTION: A method for modifying a fluororesin includes two steps. The first step irradiates first gas containing an organic compound containing oxygen atoms with ultraviolet light indicating intensity in a wavelength region of...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide an improved method and apparatus for modifying a fluororesin.SOLUTION: A method for modifying a fluororesin includes two steps. The first step irradiates first gas containing an organic compound containing oxygen atoms with ultraviolet light indicating intensity in a wavelength region of at least 205 nm or less, and brings the first gas irradiated with the ultraviolet light into contact with a fluororesin. The second step irradiates second gas containing oxygen molecules with the ultraviolet light, and brings the second gas irradiated with the ultraviolet light into contact with the fluororesin. A modifying apparatus includes at least one gas supply port for supplying first gas containing an organic compound containing oxygen atoms, and second gas containing oxygen molecules, and a light source for irradiating the supplied first gas and second gas with ultraviolet light indicating intensity in a wavelength region of a wavelength of 205 nm or less.SELECTED DRAWING: Figure 1
【課題】改善したフッ素樹脂の改質方法及び改質装置を提供する。【解決手段】フッ素樹脂の改質方法は、二つの工程を含む。第一工程では、酸素原子を内包する有機化合物を含む第一ガスに、少なくとも205nm以下の波長域に強度を示す紫外光を照射し、前記紫外光が照射された前記第一ガスをフッ素樹脂に接触させる。第二工程では、酸素分子を含む第二ガスに、前記紫外光を照射し、前記紫外光が照射された前記第二ガスを前記フッ素樹脂に接触させる。改質装置は、酸素原子を内包する有機化合物を含む第一ガス、及び、酸素分子を含む第二ガスを供給するための、少なくとも一つのガス供給口と、波長205nm以下の波長域に強度を示す紫外光を、供給された前記第一ガスと前記第二ガスに向けて照射する光源とを備える。【選択図】図1 |
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