SUBSTRATE TRANSPORT METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
To provide a substrate transfer method capable of preventing photocorrosion from occurring on the surface of a substrate.SOLUTION: In a substrate transport method, a substrate is transported into a receiving unit, and the presence of the substrate in the receiving unit is confirmed by detecting that...
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| Format: | Patent |
| Sprache: | eng ; jpn |
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| Zusammenfassung: | To provide a substrate transfer method capable of preventing photocorrosion from occurring on the surface of a substrate.SOLUTION: In a substrate transport method, a substrate is transported into a receiving unit, and the presence of the substrate in the receiving unit is confirmed by detecting that the light emitted from an optical sensor 302 is blocked by the substrate transported to the receiving unit. Then, before the substrate is unloaded from the receiving unit, light irradiation from the optical sensor 302 is stopped.SELECTED DRAWING: Figure 5
【課題】フォトコロージョンの、基板の表面への発生を防止することができる基板搬送方法が提供される。【解決手段】基板搬送方法は、基板を、受け入れユニットに搬入し、受け入れユニットに搬送された基板によって光センサ３０２から照射された光が遮断されたことを検出して、基板が受け入れユニットに存在することを確認し、基板を受け入れユニットから搬出する前に、光センサ３０２からの光の照射を停止する。【選択図】図５ |
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