SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
To ensure the reliability of a semiconductor device and to improve the performance of the semiconductor device.SOLUTION: A semiconductor device including regions 1A and 2A has an n-type semiconductor substrate SUB having a surface TS and back surfaces BS1 and BS2, an IGBT formed on the semiconductor...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To ensure the reliability of a semiconductor device and to improve the performance of the semiconductor device.SOLUTION: A semiconductor device including regions 1A and 2A has an n-type semiconductor substrate SUB having a surface TS and back surfaces BS1 and BS2, an IGBT formed on the semiconductor substrate SUB in the region 1A, and a diode formed on the semiconductor substrate SUB in the region 2A. Here, the thickness T1 of the semiconductor substrate SUB in the region 1A is thinner than the thickness T2 of the semiconductor substrate SUB in the region 2A.SELECTED DRAWING: Figure 5
【課題】半導体装置の信頼性を確保すると共に、半導体装置の性能を向上させる。【解決手段】領域1Aおよび領域2Aを含む半導体装置は、表面TSおよび裏面BS1、BS2を有するn型の半導体基板SUBと、領域1Aの半導体基板SUBに形成されたIGBTと、領域2Aの半導体基板SUBに形成されたダイオードとを備える。ここで、領域1Aの半導体基板SUBの厚さT1は、領域2Aの半導体基板SUBの厚さT2よりも薄い。【選択図】図5 |
---|