SUBSTRATE PROCESSING APPARATUS

To provide a substrate processing apparatus with improved reliability in substrate processing.SOLUTION: A substrate processing apparatus 1000 includes a baking chamber 1110, a chamber door 1200, a first support plate 1120, a first separation wall that divides the space provided on the first support...

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Bibliographische Detailangaben
Hauptverfasser:	EUM KISANG, KANG JONGWHA, PARK DONGWOON, LEE JUNGHYUN, LEE WOORAM, KIM KWANGSOO, LEE YOUNGJUN, JUNG SUNWOOK, CHO JUYEON, JUNG YOUNGHUN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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