PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

To provide photoresist compositions and pattern formation methods.SOLUTION: There is provided a photoresist composition, comprising: a first polymer comprising: a first repeating unit comprising a hydroxyaryl group; a second repeating unit comprising a first acid-labile group; and a third repeating unit comprising a first base-soluble group having a pKa of 12 or less, and not comprising a hydroxyaryl group; wherein the first, second, and third repeating units of the first polymer are different from each other, and the first polymer is free of lactone groups; a second polymer comprising: a first repeating unit comprising a second acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a second base-soluble group having a pKa of 12 or less; wherein the first, second, and third repeating units of the second polymer are structurally different from each other; and a solvent, wherein the first polymer and the second polymer are different from each other.SELECTED DRAWING: None 【課題】 フォトレジスト組成物及びパターン形成方法を提供する。【解決手段】 第１のポリマーであって、ヒドロキシアリール基を含む第１の繰り返し単位と、第１の酸不安定基を含む第２の繰り返し単位と、１２以下のｐＫａを有し、且つヒドロキシアリール基を含まない第１の塩基可溶性基を含む第３の繰り返し単位とを含み、第１のポリマーの第１、第２及び第３の繰り返し単位は、互いに異なり、及び第１のポリマーは、ラクトン基を含まない、第１のポリマーと、第２のポリマーであって、第２の酸不安定基を含む第１の繰り返し単位と、ラクトン基を含む第２の繰り返し単位と、１２以下のｐＫａを有する第２の塩基可溶性基を含む第３の繰り返し単位とを含み、第２のポリマーの第１、第２及び第３の繰り返し単位は、互いに構造的に異なる、第２のポリマーと、溶媒とを含むフォトレジスト組成物であって、第１のポリマーと第２のポリマーとは、互いに異なる、フォトレジスト組成物。【選択図】なし