POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILM

To provide a polishing liquid composition for a silicon oxide film, capable of improving the smoothness of a polished substrate surface, while maintaining its polishing speed.SOLUTION: The present disclosure relates to a polishing liquid composition for a silicon oxide film. In one embodiment, this polishing liquid composition contains: cerium oxide particles (component A); a water-soluble anionic polymer (component B); an unsaturated cyclic compound (component C); and an aqueous medium, wherein component B has an aromatic group in the molecule, and the component C has a functional group represented by formula (I) or formula (II) in the cyclic skeleton thereof.SELECTED DRAWING: None 【課題】一態様において、研磨速度を確保しつつ、研磨後の基板表面の平坦性を向上できる酸化珪素膜用研磨液組成物を提供する。【解決手段】本開示は、一態様において、酸化セリウム粒子（成分Ａ）と、水溶性アニオン性ポリマー（成分Ｂ）と、不飽和環状化合物（成分Ｃ）と、水系媒体とを含有し、成分Ｂが、分子内に芳香族基を有し、成分Ｃが、環状骨格中に下記式（Ｉ）又は式（ＩＩ）で表される官能基を有する、酸化珪素膜用研磨液組成物に関する。JPEG2023098704000016.jpg32161【選択図】なし