ELECTROSTATIC CHUCK MEMBER, ELECTROSTATIC CHUCK DEVICE, AND MANUFACTURING METHOD FOR ELECTROSTATIC CHUCK MEMBER

To provide an electrostatic chuck member, an electrostatic chuck device, and a manufacturing method for an electrostatic chuck member, capable of suppressing uneven temperature of a mounting surface by suppressing the height dimension of a gas flow path.SOLUTION: An electrostatic chuck member includ...

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Bibliographische Detailangaben
Hauptverfasser: OTSUKA TAKASHI, INUI BINSHO, ICHIYOSHI TAKU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide an electrostatic chuck member, an electrostatic chuck device, and a manufacturing method for an electrostatic chuck member, capable of suppressing uneven temperature of a mounting surface by suppressing the height dimension of a gas flow path.SOLUTION: An electrostatic chuck member includes: a dielectric substrate having a first support plate and a second support plate that are stacked in the thickness direction and are provided with a mounting surface on which a sample is to be mounted; and a suction electrode embedded inside the dielectric substrate. Between the first and second support plates, a gas flow path is provided which is formed by concave grooves provided on at least one of the surfaces facing each other and covered by the other. The dimension of the gas flow path in the height direction is 90 μm or more and 300 μm or less, The width dimension of the gas flow path is 500 μm or more and 3000 μm or less.SELECTED DRAWING: Figure 1 【課題】ガス流路の高さ寸法を抑え載置面の温度の不均一を抑制できる静電チャック部材、静電チャック装置、および静電チャック部材の製造方法を提供する。【解決手段】試料を搭載する載置面が設けられ厚さ方向に積層される第1支持板および第2支持板を有する誘電体基板と、誘電体基板の内部に埋め込まれる吸着電極と、を備え、第1支持板と第2支持板との間には、互いに対向する面のうち少なくとも一方に設けられ他方に覆われる凹溝によって形成されるガス流路が設けられ、ガス流路の高さ方向の寸法は、90μm以上300μm以下であり、ガス流路の幅寸法は、500μm以上3000μm未満である、静電チャック部材。【選択図】図1