SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

To prevent a liquid from being deposited to a substrate again in a case where the liquid is removed from the substrate by a processing fluid.SOLUTION: A substrate processing device comprises: a processing chamber including a processing space for processing a substrate; a support part which is stored...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIRAKAWA HAJIME, ANDO YUKITSUGU, MOTONO TOMOHIRO, SUMI CHIKATAKE, INABA MAKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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