COATING DEVICE AND COATING METHOD
To provide a coating device which can suppress formation of coating irregularity and form a coated film of a uniform thickness even when a foreign matter exists between a stage and a substrate.SOLUTION: A coating device includes: a stage on which a substrate is mounted; and a coating unit which ejec...
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| Sprache: | eng ; jpn |
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| Zusammenfassung: | To provide a coating device which can suppress formation of coating irregularity and form a coated film of a uniform thickness even when a foreign matter exists between a stage and a substrate.SOLUTION: A coating device includes: a stage on which a substrate is mounted; and a coating unit which ejects coating liquid while moving relatively in one direction with respect to the substrate mounted on the surface of the stage and thereby forms a coating film on the substrate. The stage has an exclusion area holding part which sucks and holds an exclusion area other than a coating area of the substrate on which the coating film is formed and a coating area holding part which sucks and holds the coating area. The exclusion area holding part is provided so as to surround the coating area and is formed so that the substrate can be held on the stage while the coating area holding part is released.SELECTED DRAWING: Figure 2
【課題】ステージと基板との間に異物が存在している場合であっても、塗布ムラが形成されるのを抑え、均一厚さの塗布膜を形成することができる塗布装置を提供する。【解決手段】基板を載置するステージと、ステージの表面に載置された基板に対し相対的に一方向に移動しつつ塗布液を吐出することにより基板上に塗布膜を形成する塗布ユニットと、を備える塗布装置であって、ステージは、塗布膜が形成される基板の塗布領域以外の除外領域を吸引して保持する除外領域保持部と、塗布領域を吸引して保持する塗布領域保持部と、を有しており、除外領域保持部は、塗布領域を囲うように設けられ、塗布領域保持部を解除した状態で基板をステージ上に保持可能に形成されている構成とする。【選択図】図２ |
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