METHOD OF PRODUCING SECONDARY BATTERY

To provide a method of producing a secondary battery capable of stabilizing a coating width of a mixture paste coated on an electrode base material.SOLUTION: A method of producing a secondary battery includes a simultaneous coating step of coating one strip of a positive electrode mixture paste 23A...

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Bibliographische Detailangaben
Hauptverfasser: ISHIZU SEIJI, ICHINO YU, ISHIZUKA NAOHIRO, HIRAHARA YUKI, MORI SHINGO, URAKAMI TAICHI, SAITO KO, MORIYA SHUMPEI, UMEHARA MASAKAZU, KISHIMOTO NAOYA
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a method of producing a secondary battery capable of stabilizing a coating width of a mixture paste coated on an electrode base material.SOLUTION: A method of producing a secondary battery includes a simultaneous coating step of coating one strip of a positive electrode mixture paste 23A and two strips of an insulation paste 24A on a positive electrode base material 22 so that one strip of the insulating paste 24A is adjacent to each end one by one in a width direction in one strip of the positive electrode mixture paste 23A using a discharge part 34A capable of discharging the positive electrode mixture paste 23A and the insulating paste 24A onto the positive electrode base material 22. Based on a detection result of a coating width W1 of the positive electrode mixture paste 23A in the simultaneous coating step by an image inspection section 35, the simultaneous coating step includes a gap adjustment step of changing a distance of the discharge part 34A and the positive electrode base material 22 so that the coating width W1 of the positive electrode mixture paste 23A may be brought close to a target value.SELECTED DRAWING: Figure 5 【課題】電極基材に塗工された合剤ペーストの塗工幅を安定させることが可能な二次電池の製造方法を提供する。【解決手段】正極合剤ペースト23A及び絶縁ペースト24Aを正極基材22上に吐出可能な吐出部34Aを用い、1条の正極合剤ペースト23Aにおける幅方向の各端に1つずつ1条の絶縁ペースト24Aが隣接するように、1条の正極合剤ペースト23Aと2条の絶縁ペースト24Aとを正極基材22上に塗工する同時塗工工程を含み、同時塗工工程は、画像検査部35による同時塗工工程における正極合剤ペースト23Aの塗工幅W1の検出結果に基づいて、正極合剤ペースト23Aの塗工幅W1を目標値に近づけるように、吐出部34Aと正極基材22との距離を変えるギャップ調整工程を含む。【選択図】図5