SEMICONDUCTOR DEVICE
To provide a semiconductor device with excellent electric characteristics.SOLUTION: A semiconductor device includes a conductor, a first insulator in contact with a side surface of the conductor, a second insulator in contact with an upper surface of the conductor and an upper surface of the first i...
Gespeichert in:
Hauptverfasser: | , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To provide a semiconductor device with excellent electric characteristics.SOLUTION: A semiconductor device includes a conductor, a first insulator in contact with a side surface of the conductor, a second insulator in contact with an upper surface of the conductor and an upper surface of the first insulator, and an oxide on the second insulator. The oxide includes a region overlapping with the conductor through the second insulator. The maximum height (Rz) of a roughness curve on the upper surface of the conductor is 6.0 nm or less. The region includes crystals. A c-axis of the crystal is aligned in a normal direction of the upper surface of the conductor.SELECTED DRAWING: Figure 1
【課題】良好な電気特性を有する半導体装置を提供する。【解決手段】導電体と、導電体の側面に接する第1の絶縁体と、導電体の上面、および、第1の絶縁体の上面と接する第2の絶縁体と、第2の絶縁体上の酸化物と、を有し、酸化物は、第2の絶縁体を介して、導電体と重畳する領域を有し、導電体の上面における、粗さ曲線の最大高さ(Rz)が6.0nm以下であり、領域は、結晶を含み、結晶のc軸は、導電体の上面の法線方向に配向している半導体装置である。【選択図】図1 |
---|