EXPOSURE APPARATUS, CONTROL METHOD OF THE SAME, AND METHOD FOR MANUFACTURING ARTICLE

To provide a technique advantageous in improving through-put in an exposure apparatus.SOLUTION: An exposure apparatus that performs scanning exposure of a substrate comprises: a stage which holds the substrate; and a control part which controls driving of the stage according to a driving profile regarding each of a plurality of processing associated with moving of the stage, where the driving profile includes: an acceleration zone for accelerating the stage; a constant speed zone for moving the stage at constant speed; and a deceleration zone for decelerating the stage, the plurality of processing includes scanning exposure in which exposure processing is performed in the constant speed zone, and non-exposure processing in which the scanning exposure is not performed in the constant speed zone, and the control part changes an acceleration profile of the acceleration zone in the driving profile in the exposure processing and the non-exposure processing such that the exposure processing and the non-exposure processing have the same maximum acceleration of the acceleration zone, and the non-exposure processing has shorter acceleration zone than the exposure processing.SELECTED DRAWING: Figure 1 【課題】露光装置におけるスループットの向上の点で有利な技術を提供する。【解決手段】基板の走査露光を行う露光装置は、前記基板を保持するステージと、前記ステージの移動を伴う複数の処理の各々について、駆動プロファイルに従って前記ステージの駆動を制御する制御部と、を備え、前記駆動プロファイルは、前記ステージを加速させる加速区間と、前記ステージを等速移動させる等速区間と、前記ステージを減速させる減速区間とを含み、前記複数の処理は、前記等速区間で前記走査露光を行う露光処理と、前記等速区間で前記走査露光を行わない非露光処理とを含み、前記制御部は、前記露光処理と前記非露光処理とで前記加速区間の最大加速度が同じで、且つ、前記露光処理より前記非露光処理の方が前記加速区間が短くなるように、前記露光処理と前記非露光処理とで前記駆動プロファイルにおける前記加速区間の加速度プロファイルを変更する。【選択図】図１