MANUFACTURING METHOD OF METALIZED FILM, MANUFACTURING METHOD OF FILM CAPACITOR, AND MANUFACTURING EQUIPMENT OF METALIZED FILM

To provide a manufacturing method of a metalized film capable of easily manufacturing a metalized film having a thin deposited portion along a straight line.SOLUTION: The manufacturing method of a metalized film 1 includes a vapor deposition step of evaporating a metal 6 from an evaporation source 3...

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Bibliographische Detailangaben
Hauptverfasser: MORITA HIDEYUKI, OKOCHI MOTOHIRO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:To provide a manufacturing method of a metalized film capable of easily manufacturing a metalized film having a thin deposited portion along a straight line.SOLUTION: The manufacturing method of a metalized film 1 includes a vapor deposition step of evaporating a metal 6 from an evaporation source 30 and allowing the metal 6 to pass through both sides of a metal wire 5 to deposit the metal 6 on a dielectric film 2 in a state in which the metal wire 5 exists between the transported dielectric film 2 and the evaporation source 30 so as to be parallel to the transport direction of the dielectric film 2, and in which the metal wire 5 is separated from the dielectric film 2.SELECTED DRAWING: Figure 1 【課題】直線に沿って膜厚の薄い蒸着部を有する金属化フィルムを容易に製造することができる金属化フィルムの製造方法を提供する。【解決手段】金属化フィルム1の製造方法は、搬送される誘電体フィルム2と、蒸発源30との間に金属線5が誘電体フィルム2の搬送方向に平行に存在し、金属線5が誘電体フィルム2から離れた状態で、蒸発源30から金属6を蒸発させ、金属6を金属線5の両側を通過させて誘電体フィルム2に蒸着させる蒸着工程を含む。【選択図】図1