MANUFACTURING METHOD FOR ANTIREFLECTION FILM

To provide a manufacturing method capable of manufacturing an antireflection film of a low reflectivity, and an antireflection film using the method.SOLUTION: A manufacturing method for an antireflection film is a manufacturing method for an antireflection film 10 having an uneven layer 14 and a coa...

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Hauptverfasser:	KUSASHIMA KOHARU, HAN HIN, ARAI YASUSHI, ISHIKAWA DAIKI, KONDO SHIGERU, NAMIKI KEIICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a manufacturing method capable of manufacturing an antireflection film of a low reflectivity, and an antireflection film using the method.SOLUTION: A manufacturing method for an antireflection film is a manufacturing method for an antireflection film 10 having an uneven layer 14 and a coat layer 15 containing fluorine, comprising an uneven layer formation step of forming the uneven layer 14 on a base material 11; a coat layer formation step of forming the coat layer 15 on the uneven layer 14 using fluorine-containing gas; and a holding step of holding the base material 11 on which the uneven layer 4 and the coat layer 15 are formed under a high-temperature and high-humidity atmosphere.SELECTED DRAWING: Figure 1 【課題】低反射率の反射防止膜を製造することができる製造方法及びこれを用いた反射防止膜を提供。【解決手段】反射防止膜の製造方法は、凹凸層１４と、フッ素を含有するコート層１５とを有する反射防止膜１０の製造方法であって、基材１１上に、凹凸層１４を形成する凹凸層形成工程と、凹凸層１４上にフッ素含有ガスを用いてコート層１５を成膜するコート層成膜工程と、凹凸層４と前記コート層１５とが形成された基材１１を高温高湿雰囲気下で保持する保持工程とを備える。【選択図】図１