APPARATUS FOR INSPECTING CHEMICAL SOLUTION AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

To provide an apparatus for inspecting a chemical solution capable of inspecting a bubble and a particle only by adding a simple configuration, and a substrate processing apparatus including the same.SOLUTION: An apparatus 100 for inspecting a chemical solution comprises: a base unit 110 formed with...

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Bibliographische Detailangaben
Hauptverfasser: JUNG SUNG CHUL, YUN YOUNG UN, SONG YOUNG JUN
Format: Patent
Sprache:eng ; jpn
Schlagworte:
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