APPARATUS FOR INSPECTING CHEMICAL SOLUTION AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
To provide an apparatus for inspecting a chemical solution capable of inspecting a bubble and a particle only by adding a simple configuration, and a substrate processing apparatus including the same.SOLUTION: An apparatus 100 for inspecting a chemical solution comprises: a base unit 110 formed with...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; jpn |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!