APPARATUS FOR INSPECTING CHEMICAL SOLUTION AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

To provide an apparatus for inspecting a chemical solution capable of inspecting a bubble and a particle only by adding a simple configuration, and a substrate processing apparatus including the same.SOLUTION: An apparatus 100 for inspecting a chemical solution comprises: a base unit 110 formed with an inlet 1101 through which a chemical solution is introduced; a flow path unit 120 in which the chemical solution introduced through the inlet is moved while velocity of the fluid is changed, and which includes a first region unit provided adjacent to the inlet of the base unit and a second region unit being in series communication with the first region unit, in which the chemical solution discharged from the first region unit is moved; a detecting unit including a first detecting member for detecting a first signal that is an electrical signal of the first region unit, and a second detecting member for detecting a second signal that is an electrical signal of the second region unit; and a determining unit 140 for receiving a signal from the detecting unit and determining that a particle and a bubble are detected if current of the first signal and the second signal is changed compared to a reference value, and discriminating and determining the particle and the bubble according to difference in current between the first signal and the second signal or time difference, in which current is changed.SELECTED DRAWING: Figure 3 【課題】簡素な構成の追加だけで気泡とパーティクルを検査できる薬液検査装置及びそれを含む基板処理装置を提供する。【解決手段】薬液検査装置１００は、薬液が流入する入口１１０１が形成されるベース部１１０と、入口に流入する薬液が流体の速度が変化しながら移動して、ベース部の入口に隣接するように設けられる第１領域部と、第１領域部と直列に連通されて第１領域部から排出される薬液が移動する第２領域部を含む流路部１２０と、第１領域部の電気信号である第１信号を感知する第１感知部材と、第２領域部の電気信号である第２信号を感知する第２感知部材を含む感知部と、感知部から信号を受けて、基準値に比べて第１信号及び第２信号の電流が変化するとパーティクルと気泡が感知されたものと判別し、第１信号と第２信号の電流差又は電流が変化する時間差によってパーティクルと気泡を区別して判別する判別部１４０を含む。【選択図】図３