RAW MATERIAL GAS SUPPLY METHOD, RAW MATERIAL GAS SUPPLY MECHANISM, AND FILM DEPOSITION SYSTEM

To provide a technology capable of suppressing a deterioration of a film deposition raw material in a raw material container when a raw material gas vaporized by heating the film deposition raw material accommodated in the raw material container is supplied.SOLUTION: A raw material gas supply method...

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Bibliographische Detailangaben
Hauptverfasser:	GOMI TOMOYUKI, MOROI MASAYUKI, FURUYA YUICHI, SATO KOICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	To provide a technology capable of suppressing a deterioration of a film deposition raw material in a raw material container when a raw material gas vaporized by heating the film deposition raw material accommodated in the raw material container is supplied.SOLUTION: A raw material gas supply method supplies a raw material gas to a treatment part with a carrier gas via a piping, the raw material gas being produced by vaporizing a film deposition raw material by heating a raw material container in which the film deposition raw material is reserved and a sealed gas is sealed. The raw material gas supply method includes the steps of: substituting the sealed gas in the raw material container with a substitution gas that does not deteriorate the raw material gas; determining a substitution with the substitution gas by measuring a pressure in the piping with a pressure meter; and supplying the raw material gas by heating the raw material container after a substitution with the substitution gas is performed.SELECTED DRAWING: Figure 3 【課題】原料容器内に収容された成膜原料を加熱して気化された原料ガスを供給する際に、原料容器内の成膜原料の劣化を抑制することができる技術を提供する。【解決手段】成膜原料を貯留し封入ガスが封入された原料容器を加熱し、成膜原料を気化させることにより生成された原料ガスを、キャリアガスにより配管を介して処理部に供給する原料ガス供給方法は、原料容器内の封入ガスを、原料ガスを劣化させない置換ガスに置換する工程と、圧力計により前記配管内の圧力を測定して、置換ガスによる置換の判定を行う工程と、置換ガスによる置換が行われたと判定された後、原料容器を加熱し、原料ガスを供給する工程とを有する。【選択図】図３