PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING CIRCUIT WIRING
To provide a photosensitive composition which is less likely to be photosensitive to light having a wavelength of 365 nm, is likely to be photosensitive to light having a wavelength of 436 nm, and is excellent in storage stability under a yellow lamp, to provide a photosensitive composition which is...
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Zusammenfassung: | To provide a photosensitive composition which is less likely to be photosensitive to light having a wavelength of 365 nm, is likely to be photosensitive to light having a wavelength of 436 nm, and is excellent in storage stability under a yellow lamp, to provide a photosensitive composition which is less likely to be photosensitive to light having a wavelength of 365 nm, is likely to be photosensitive to light having a wavelength of 405 nm, and is excellent in storage stability under a yellow lamp, and to provide a transfer film, a pattern formation method, and a method for manufacturing a circuit wiring which use the photosensitive composition.SOLUTION: A photosensitive composition contains an alkali-soluble resin, a polymerizable compound and a photopolymerization initiator, and satisfies predetermined requirements 3 and 4.SELECTED DRAWING: None
【課題】波長365nmの光では感光しづらく、波長436nmの光で感光し易く、且つ、黄色灯下での保存安定性に優れる、感光性組成物を提供する。また、波長365nmの光では感光しづらく、波長405nmの光で感光し易く、且つ、黄色灯下での保存安定性に優れる、感光性組成物を提供する。また、上記感光性組成物を使用した、転写フィルム、パターン形成方法、及び回路配線の製造方法を提供する。【解決手段】アルカリ可溶性樹脂と、重合性化合物と、光重合開始剤と、を含む感光性組成物であって、所定の要件3及び4を満たす、感光性組成物。【選択図】なし |
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