THERMAL PROCESSING DEVICE

To improve maintainability.SOLUTION: A thermal processing device comprises a heating part, a bottom wall, a chamber, and a guide part. The heating part supports and heats a substrate to which a processing liquid is supplied. The bottom wall surrounds the substrate supported by the heating part. The...

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Bibliographische Detailangaben
Hauptverfasser:	OSHIMA KAZUHIKO, KUGA TAKAHIRO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	To improve maintainability.SOLUTION: A thermal processing device comprises a heating part, a bottom wall, a chamber, and a guide part. The heating part supports and heats a substrate to which a processing liquid is supplied. The bottom wall surrounds the substrate supported by the heating part. The chamber includes a top plate covering the heating part and a side wall provided between the bottom wall and the top plate, and is freely attachable/detachable to/from a base part at which the heating part is provided. The guide part guides the movement of the chamber from a mounting position surrounding the substrate on the heating part by a space in the chamber along a predetermined movable direction along an upper surface of the heating part.SELECTED DRAWING: Figure 14 【課題】メンテナンス性を向上させる。【解決手段】熱処理装置は、加熱部と、底壁と、チャンバと、ガイド部と、を備える。加熱部は、処理液が供給された基板を支持して加熱する。底壁は、加熱部に支持された基板を囲む。チャンバは、加熱部を覆う天板と、底壁と天板との間に設けられた側壁とを含み、加熱部が設けられるベース部に対して着脱自在である。ガイド部は、加熱部の上面に沿った所定の可動方向に沿って、チャンバ内の空間が加熱部上の基板を囲む装着位置からのチャンバの移動をガイドする。【選択図】図１４