HYPOCHLOROUS WATER GENERATING COMPOSITION, HYPOCHLOROUS WATER, AND METHOD FOR PRODUCING HYPOCHLOROUS WATER GENERATING COMPOSITION
To provide a composition that is dissolved in an aqueous solvent to generate hypochlorous water, and can suppress the occurrence of a gas before the dissolution.SOLUTION: The present invention discloses a hypochlorous water generating composition that is dissolved in an aqueous solvent and comprises...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | To provide a composition that is dissolved in an aqueous solvent to generate hypochlorous water, and can suppress the occurrence of a gas before the dissolution.SOLUTION: The present invention discloses a hypochlorous water generating composition that is dissolved in an aqueous solvent and comprises at least one selected from chlorinated isocyanuric acid and salts thereof, bicarbonate, a pH modifier, and a gas occurrence inhibitor. The gas occurrence inhibitor can suppress the occurrence of a gas in a state where the composition has not been dissolved in the aqueous solvent.SELECTED DRAWING: None
【課題】水性溶媒に溶解することによって次亜塩素酸水を生成するために用いられ、且つ、溶解前におけるガス発生を抑制することが可能な組成物を提供すること。【解決手段】本発明は、水性溶媒に溶解して用いられる次亜塩素酸水生成用組成物であって、塩素化イソシアヌル酸及びその塩から選択される少なくとも1種、炭酸水素塩、pH調整剤、並びにガス発生抑制剤を含む、組成物を提供する。ガス発生抑制剤は、前記組成物が前記水性溶媒に溶解されていない状態においてガス発生を抑制しうる。【選択図】なし |
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