COMPOSITION FOR MASK PROCESSING AND METHOD FOR USING THE SAME

To solve a problem of a case where functional powder drops from a mask even if a composition for mask processing containing functional powder is applied to the mask by spray or the like, and therefore an effect of a composition for mask processing cannot be obtained continuously.SOLUTION: A composit...

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1. Verfasser: SUGIHARA MEGUMI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:To solve a problem of a case where functional powder drops from a mask even if a composition for mask processing containing functional powder is applied to the mask by spray or the like, and therefore an effect of a composition for mask processing cannot be obtained continuously.SOLUTION: A composition for mask processing of the present invention contains functional particles and dispersion medium having the average particle diameter of 0.1 μm to 20 μm. Further, a spray container containing the composition for mask processing includes the composition for mask processing of the present invention, and the spray container housing the composition.SELECTED DRAWING: Figure 1 【課題】機能性粉末を含有しているマスク処理用組成物を噴霧等によってマスクに適用しても、機能性粉末がマスクから脱落し、それによってマスク処理用組成物の効果が持続的に得られない場合があるという問題を解決する。【解決手段】本発明のマスク処理用組成物は、平均粒子径が0.1μm~20μmである機能性粒子及び分散媒を含有している。また、マスク処理用組成物入りスプレー容器は、本発明のマスク処理用組成物、及びこの組成物を収容しているスプレー容器を含む。【選択図】図1