EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD
To reduce lowering of productivity.SOLUTION: An exposure device for superposing and exposing a pattern of a second layer on a substrate formed with a first layer including a first pattern region including a first pattern formed by light transmitting through a pattern formation region of an original...
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| creator | ZHANG QU HIOKI MASANORI SOSAKO RYO KAWABATA NOBUYUKI IKEDA KENJI SUZUKI YU |
| description | To reduce lowering of productivity.SOLUTION: An exposure device for superposing and exposing a pattern of a second layer on a substrate formed with a first layer including a first pattern region including a first pattern formed by light transmitting through a pattern formation region of an original plate and a second pattern region including a second pattern formed by light transmitting through a partial region of the pattern formation region of the original plate includes a detection part for detecting an alignment mark, and a control part for controlling positioning between the original plate and the substrate, wherein the control part controls positioning between the original plate and the substrate for forming a pattern in the second layer on the basis of a detection result of a plurality of alignment marks including the alignment mark for determining positional deviation between the first pattern region and the second pattern region.SELECTED DRAWING: Figure 6
【課題】 生産性の低下を低減すること。【解決手段】 原版のパターン形成領域を透過した光によって形成された第１パターンを含む第１パターン領域と、原版のパターン形成領域の一部の領域を透過した光によって形成された第２パターンを含む第２パターン領域と、を含む第１層が形成された基板上に第２層のパターンを重ねて露光する露光装置であって、アライメントマークを検出する検出部と、原版と基板との位置合わせを制御する制御部と、を有し、前記制御部は、第１パターン領域と第２パターン領域との位置ずれを求めるためのアライメントマークを含む複数のアライメントマークの検出結果に基づいて、第２層におけるパターン形成のために原版と基板との位置合わせを制御する。【選択図】 図６ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2023039134A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2023039134A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2023039134A3</originalsourceid><addsrcrecordid>eNrjZHByjQjwDw4NclVwcQ3zdHbVUYAL-LqGePi76Cg4-rkoOAaFeDr7AMUc_ULdHJ1DQoM8_dyhKngYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBkbGBsaWhsYmjMVGKAFgAK54</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>ZHANG QU ; HIOKI MASANORI ; SOSAKO RYO ; KAWABATA NOBUYUKI ; IKEDA KENJI ; SUZUKI YU</creator><creatorcontrib>ZHANG QU ; HIOKI MASANORI ; SOSAKO RYO ; KAWABATA NOBUYUKI ; IKEDA KENJI ; SUZUKI YU</creatorcontrib><description>To reduce lowering of productivity.SOLUTION: An exposure device for superposing and exposing a pattern of a second layer on a substrate formed with a first layer including a first pattern region including a first pattern formed by light transmitting through a pattern formation region of an original plate and a second pattern region including a second pattern formed by light transmitting through a partial region of the pattern formation region of the original plate includes a detection part for detecting an alignment mark, and a control part for controlling positioning between the original plate and the substrate, wherein the control part controls positioning between the original plate and the substrate for forming a pattern in the second layer on the basis of a detection result of a plurality of alignment marks including the alignment mark for determining positional deviation between the first pattern region and the second pattern region.SELECTED DRAWING: Figure 6
【課題】 生産性の低下を低減すること。【解決手段】 原版のパターン形成領域を透過した光によって形成された第１パターンを含む第１パターン領域と、原版のパターン形成領域の一部の領域を透過した光によって形成された第２パターンを含む第２パターン領域と、を含む第１層が形成された基板上に第２層のパターンを重ねて露光する露光装置であって、アライメントマークを検出する検出部と、原版と基板との位置合わせを制御する制御部と、を有し、前記制御部は、第１パターン領域と第２パターン領域との位置ずれを求めるためのアライメントマークを含む複数のアライメントマークの検出結果に基づいて、第２層におけるパターン形成のために原版と基板との位置合わせを制御する。【選択図】 図６</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230320&DB=EPODOC&CC=JP&NR=2023039134A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230320&DB=EPODOC&CC=JP&NR=2023039134A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHANG QU</creatorcontrib><creatorcontrib>HIOKI MASANORI</creatorcontrib><creatorcontrib>SOSAKO RYO</creatorcontrib><creatorcontrib>KAWABATA NOBUYUKI</creatorcontrib><creatorcontrib>IKEDA KENJI</creatorcontrib><creatorcontrib>SUZUKI YU</creatorcontrib><title>EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD</title><description>To reduce lowering of productivity.SOLUTION: An exposure device for superposing and exposing a pattern of a second layer on a substrate formed with a first layer including a first pattern region including a first pattern formed by light transmitting through a pattern formation region of an original plate and a second pattern region including a second pattern formed by light transmitting through a partial region of the pattern formation region of the original plate includes a detection part for detecting an alignment mark, and a control part for controlling positioning between the original plate and the substrate, wherein the control part controls positioning between the original plate and the substrate for forming a pattern in the second layer on the basis of a detection result of a plurality of alignment marks including the alignment mark for determining positional deviation between the first pattern region and the second pattern region.SELECTED DRAWING: Figure 6
【課題】 生産性の低下を低減すること。【解決手段】 原版のパターン形成領域を透過した光によって形成された第１パターンを含む第１パターン領域と、原版のパターン形成領域の一部の領域を透過した光によって形成された第２パターンを含む第２パターン領域と、を含む第１層が形成された基板上に第２層のパターンを重ねて露光する露光装置であって、アライメントマークを検出する検出部と、原版と基板との位置合わせを制御する制御部と、を有し、前記制御部は、第１パターン領域と第２パターン領域との位置ずれを求めるためのアライメントマークを含む複数のアライメントマークの検出結果に基づいて、第２層におけるパターン形成のために原版と基板との位置合わせを制御する。【選択図】 図６</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHByjQjwDw4NclVwcQ3zdHbVUYAL-LqGePi76Cg4-rkoOAaFeDr7AMUc_ULdHJ1DQoM8_dyhKngYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBkbGBsaWhsYmjMVGKAFgAK54</recordid><startdate>20230320</startdate><enddate>20230320</enddate><creator>ZHANG QU</creator><creator>HIOKI MASANORI</creator><creator>SOSAKO RYO</creator><creator>KAWABATA NOBUYUKI</creator><creator>IKEDA KENJI</creator><creator>SUZUKI YU</creator><scope>EVB</scope></search><sort><creationdate>20230320</creationdate><title>EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD</title><author>ZHANG QU ; HIOKI MASANORI ; SOSAKO RYO ; KAWABATA NOBUYUKI ; IKEDA KENJI ; SUZUKI YU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2023039134A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHANG QU</creatorcontrib><creatorcontrib>HIOKI MASANORI</creatorcontrib><creatorcontrib>SOSAKO RYO</creatorcontrib><creatorcontrib>KAWABATA NOBUYUKI</creatorcontrib><creatorcontrib>IKEDA KENJI</creatorcontrib><creatorcontrib>SUZUKI YU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHANG QU</au><au>HIOKI MASANORI</au><au>SOSAKO RYO</au><au>KAWABATA NOBUYUKI</au><au>IKEDA KENJI</au><au>SUZUKI YU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD</title><date>2023-03-20</date><risdate>2023</risdate><abstract>To reduce lowering of productivity.SOLUTION: An exposure device for superposing and exposing a pattern of a second layer on a substrate formed with a first layer including a first pattern region including a first pattern formed by light transmitting through a pattern formation region of an original plate and a second pattern region including a second pattern formed by light transmitting through a partial region of the pattern formation region of the original plate includes a detection part for detecting an alignment mark, and a control part for controlling positioning between the original plate and the substrate, wherein the control part controls positioning between the original plate and the substrate for forming a pattern in the second layer on the basis of a detection result of a plurality of alignment marks including the alignment mark for determining positional deviation between the first pattern region and the second pattern region.SELECTED DRAWING: Figure 6
【課題】 生産性の低下を低減すること。【解決手段】 原版のパターン形成領域を透過した光によって形成された第１パターンを含む第１パターン領域と、原版のパターン形成領域の一部の領域を透過した光によって形成された第２パターンを含む第２パターン領域と、を含む第１層が形成された基板上に第２層のパターンを重ねて露光する露光装置であって、アライメントマークを検出する検出部と、原版と基板との位置合わせを制御する制御部と、を有し、前記制御部は、第１パターン領域と第２パターン領域との位置ずれを求めるためのアライメントマークを含む複数のアライメントマークの検出結果に基づいて、第２層におけるパターン形成のために原版と基板との位置合わせを制御する。【選択図】 図６</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | EXPOSURE DEVICE, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD |
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