HARD MASK COMPOSITION, HARD MASK LAYER AND PATTERNING METHOD

To provide a hard mask composition that can be effectively applied to a hard mask layer having excellent solubility to a solvent, a hard mask layer containing a cured product of the hard mask composition, and a patterning method using the hard mask composition.SOLUTION: A hard mask composition conta...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM SOOHEE, KIM YOONA, HWANG WON JONG, LEE JONG-HWA, YUN HUIAN, PARK HYUNG-SEOK, LEE JAEOL, KIM HYEJEONG, JEONG SEULGI, CHAE YUNJU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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