HARD MASK COMPOSITION, HARD MASK LAYER AND PATTERNING METHOD

To provide a hard mask composition that can be effectively applied to a hard mask layer having excellent solubility to a solvent, a hard mask layer containing a cured product of the hard mask composition, and a patterning method using the hard mask composition.SOLUTION: A hard mask composition conta...

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Hauptverfasser:	KIM SOOHEE, KIM YOONA, HWANG WON JONG, LEE JONG-HWA, YUN HUIAN, PARK HYUNG-SEOK, LEE JAEOL, KIM HYEJEONG, JEONG SEULGI, CHAE YUNJU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	To provide a hard mask composition that can be effectively applied to a hard mask layer having excellent solubility to a solvent, a hard mask layer containing a cured product of the hard mask composition, and a patterning method using the hard mask composition.SOLUTION: A hard mask composition contains a polymer containing a structural unit represented by chemical formula 1 and a structural unit represented by chemical formula 2, and a solvent.SELECTED DRAWING: Figure 1 【課題】溶媒に対する溶解性に優れてハードマスク層に効果的に適用することができるハードマスク組成物、ハードマスク組成物の硬化物を含むハードマスク層、およびハードマスク組成物を使用したパターン形成方法を提供する。【解決手段】下記化学式１で表される構造単位と下記化学式２で表される構造単位とを含む重合体、および溶媒を含む、ハードマスク組成物。JPEG2023031300000050.jpg49161JPEG2023031300000051.jpg29161【選択図】図１