CLEANING MECHANISM

To provide a novel technique for setting cleaning conditions in a workpiece cleaning mechanism.SOLUTION: There is provided a cleaning mechanism including: a holding table having a holding surface to hold a workpiece; a cleaning nozzle facing the holding table and having an injection port for injecti...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	YOSHII SHUNGO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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